Exposure device

ABSTRACT

A method of manufacturing of an alignment material film includes photoaligning the alignment material film by an exposure device to split each of sections of the alignment material film corresponding to picture elements of a liquid crystal display device into two parts in a width direction of the picture elements and exposing the alignment material film from different directions of each other. In the exposure device, each of sections of the alignment material film corresponding to the picture elements of the liquid crystal display device is split into two parts in the width direction of the picture elements and the two parts are exposed from the different directions of each other, whereby the alignment material film is photoaligned. The exposure device includes a first light source and a second light source for outputting exposure light.

The present application is a Continuation application of U.S. patentapplication Ser. No. 13/824,263, filed on Mar. 15, 2013, which is basedon International Application No. PCT/JP2011/068576, filed on Aug. 16,2011, which is based on the Japanese Patent Application No. 2010-208773,filed on Sep. 17, 2010, the entire contents of which are incorporatedherein by reference.

TECHNICAL FIELD

The present invention relates to an exposure device for producing, by amultidomain exposure technique, an alignment material film for a liquidcrystal display device that displays three-dimensional images; andrelates in particular to an exposure device for photoalignment of analignment material film by splitting portions of the alignment materialfilm which correspond to picture elements of the liquid crystal displaydevice into two parts, and exposing these from different directions; orby exposing portions which correspond to pixels from a differentdirection in each adjacent pixel in the width direction thereof.

BACKGROUND ART

In the past, liquid crystals constituted by calamitic moleculescomprising a plurality of benzene or cyclohexane molecules withmodifying groups at both ends have been used in liquid crystal displaysand like, for example. Adjustments to viewing angle and contrast of thedisplay are made by causing the calamitic liquid crystals to orient in auniform direction.

In the past, to orient the liquid crystal molecules, an alignment filmcomprising, for example, a polyimide or the like, is formed on thesurface of the glass substrates for sandwiching the liquid crystals,thereby orienting the liquid crystal molecules in a predetermineddirection coincident with the alignment direction of the alignment film,through sandwiching of the liquid crystals between the alignment films.

In one example of a production method adopted when forming an orientedfilm on the surface of a glass substrate, a polyimide solution, forexample, is coated and baked onto the glass substrate, forming apolyimide film (alignment material film) several tens of nanometersthick, and thereafter the surface of the polyimide film (alignmentmaterial film) is rubbed in one direction with a rubbing roller havingcloth wound about the surface (for example, Patent Document 1).

However, with methods that involve orienting the liquid crystalmolecules by forming an alignment film on a glass substrate surface, dueto the adoption of production methods like that described above to formthe alignment film, the alignment film may become scratched by rubbingcloth that is shed by the roller as it is rubbed or by dust sloughed offfrom the polyimide film or the like, or the dust itself may becomedeposited on the surface of the alignment film. A resultant problem isthat this tends to lead to display nonuniformities and display defectsof the liquid crystal display.

In order to solve this problem, there has recently been proposed atechnique, called photoalignment, which uses ultraviolet light to alignthe alignment material film. Specifically, by irradiating an alignmentmaterial film of polyimide, azobenzene, or the like with linearpolarized or unpolarized ultraviolet light, the alignment material filmbecomes aligned in the same direction, due to its photodegradationcharacteristics. Consequently, alignment films of good alignment can beformed by a non-contact process, preventing display nonuniformities anddisplay defects of the liquid crystal displays and the like.

However, with photoalignment, in the event that the alignment materialfilm is irradiated with ultraviolet light exclusively from a singledirection, the alignment direction of the alignment film will be asingle direction only, and therefore the liquid crystal moleculessandwiched between the alignment films will orient in a single givendirection exclusively. A consequent problem is that the liquid crystaldisplay or the like will have a narrow viewing angle.

In order to solve this problem, there has recently been proposed analignment material film exposure technique called multidomain alignment(for example, in Patent Documents 2 to 4). FIG. 9 is a schematic viewshowing exposure in conventional multidomain alignment, wherein FIG. 9(a) is a side view showing multidomain alignment exposure in aconventional exposure unit, and FIG. 9 (b) is a perspective viewthereof. As shown in FIG. 9, in an exposure unit of employing amultidomain alignment system, exposure light 11 a, 12 a from twodifferent light sources (a first light source 11 and a second lightsource 12) is output at mutually different output angles, whereupon theexposure light 11 a, 12 a is transmitted through a mask 13 disposedbetween the first light source 11, the second light source 12, and amember for exposure 2. FIG. 10 is a drawing showing the mask in thismultidomain alignment system exposure unit, and an alignment film formedby a single exposure. As shown in FIG. 9 (b), the mask 13 is constitutedby a frame 130 and a pattern formation portion 131 at the centerthereof; as shown in FIG. 10, a first light-transmitting region group131 a and a second light-transmitting group 131 b in each of which aplurality of light transmission regions are arrayed in one row areformed in the pattern formation portion 131, in correspondence with therespective exposure light from the first light source 11 and the secondlight source 12. The first light-transmitting region group 131 a and thesecond light-transmitting group 131 b are disposed spaced apart in therelative scanning direction of the alignment material film with respectto the mask 13, with the respective plurality of light transmissionregions corresponding to regions split to one-half the picture elementwidth. The light transmission regions of the first light-transmittingregion group 131 a and the second light-transmitting group 131 b arearrayed with gaps between them, so that there is no overlap in thescanning direction. As shown in FIG. 10 (b), the respective lighttransmission regions of the first and the second light-transmittinggroup 131 a, 131 b are formed such that a plurality thereof (in FIG. 10(b), six) are lined up in the scanning direction. By irradiating theserespectively different regions 131 a, 131 b of the mask 13 fromdifferent directions with the exposure light 11 a, 12 a from the firstand second light sources 11, 12, the light transmitted through the lighttransmission regions irradiates and exposes the alignment material filmon the surface of the member for exposure 2, which is supported on astage 15. In so doing, through a single exposure, in both the directionof split (width direction) of the picture elements and the lengthwisedirection perpendicular thereto (the scanning direction), respectively,the alignment material film is exposed by the exposure light transmittedthrough the plurality of light transmission regions, forming analignment film in such a way that a plurality of regions, whichcorrespond to picture elements and have uniform alignment direction,line up in the width direction and lengthwise direction, as shown inFIG. 10 (c).

In this case, due to the respectively different angles of slope of theexposure light 11 a, 12 a with respect to the surface being exposed, analignment film aligned in two directions is obtained. Consequently,sections that will constitute the R (red), G (green), and blue (B)picture elements of a liquid crystal display or the like are split intohalves respectively irradiated by the exposure light 11 a, 12 a. In sodoing, two alignment directions of the alignment film are created withineach single picture element of the liquid crystal display or the like,and the liquid crystal molecules can be oriented in two directions. Inso doing, the viewing angle of the liquid crystal display or the likecan be made wider. Moreover, in a multidomain alignment system exposureunit such as this, rather than lining up a plurality of the lighttransmission regions of the mask shown in FIG. 10 in the scanningdirection, the light transmission regions could instead be constitutedto extend in the scanning direction, making these light transmissionregions correspond to regions that include a plurality of pixels linedup in the scanning direction; and by continuously transmitting lightthrough these light transmission regions, regions having uniformalignment directions can be formed in the alignment film so as to extendin a band in the scanning direction. In so doing, an alignment film inwhich each of the regions that will constitute adjacent pixels in thewidth direction has a different alignment direction is manufactured.

PRIOR ART DOCUMENTS Patent Documents

-   Patent Document 1: Japanese Laid-open Patent Application 2009-294609-   Patent Document 2: Japanese Laid-open Patent Application 2010-39485-   Patent Document 3: Japanese Laid-open Patent Application 2001-42365-   Patent Document 4: Japanese Laid-open Patent Application 2003-43492

DISCLOSURE OF THE INVENTION

Problems the Invention is Intended to Solve

However, the aforedescribed prior art has problems such as thefollowing. In a multidomain alignment system exposure unit, the maskstage 14 that supports the mask 13 is disposed towards one of the twolight sources. Consequently, the conventional exposure unit has theproblem that, in cases in which the direction in which the alignmentfilm is to be aligned necessitates a small angle of the exposure light11 a with respect to the surface being exposed, the top part of the maskstage 14 (section A in FIG. 11) will be positioned on the optical pathof the exposure light 11 a, as shown in FIG. 11, and will interfere withthe exposure light 11 a, so that the alignment film cannot be exposed inthe predetermined pattern.

Moreover, as shown in FIGS. 9 to 11, in the conventional exposure unit,the exposure light 11 a, 12 a output from the first and second lightsources 11, 12 are respectively transmitted through regions thatrespectively lie closer towards the light source side from the mask 13.Consequently, in a case in which the angle of the exposure light 11 a,12 a with respect to the surface being exposed is small, it is necessaryfor the distance between the first and second light sources 11, 12 to belong, creating the problem of a larger size of the exposure device.

With the foregoing in view, it is an object of the present invention toprovide an exposure device for manufacture, through exposure by amultidomain alignment system, of an alignment material film for use in aliquid crystal display device that displays three-dimensional images,wherein the exposure device can expose the alignment material film to apredetermined pattern in the normal fashion, even in cases necessitatinga small slope angle of the exposure light with respect to the surfacebeing exposed, so that a more compact size is possible.

Means for Solving the Problems

The exposure device according to the present invention is an exposuredevice for splitting sections of an alignment material filmcorresponding to picture elements of a liquid crystal display deviceinto two parts in the width direction thereof and exposing the film fromdifferent directions, whereby the alignment material film isphotoaligned; the exposure device having: a first and a second lightsource for outputting exposure light; a mask in which there are formed afirst light transmission region group and a second light transmissionregion group in which a plurality of light transmission regions fortransmitting the exposure light from the first and second light sourcesis arrayed in single rows; and a mask support portion for supporting themask, the mask support portion being disposed towards the first lightsource; the first and second light transmission region groups beingdisposed spaced apart in the direction of relative scanning of thealignment material film with respect to the mask; the plurality of lighttransmission regions respectively corresponding to regions equivalent toone-half of one picture element split in the width direction; the lighttransmission regions of the first light transmission region group andthe light transmission regions of the second light transmission regiongroup being arrayed with intervals therebetween such that there is nooverlap in the scanning direction; and the exposure light from the firstlight source and the second light source being caused to mutuallyintersect on the optical path between the first and second light sourcesand the alignment material film so that regions of the alignmentmaterial film which correspond to split regions of picture elements areirradiated. This exposure device splits in two the picture elements ofthe liquid crystal display device in the width direction, and exposesthe regions in such a way that the respective alignment directionsthereof are different directions, and is suited to forming an alignedfilm having a wide viewing angle.

Another exposure device according to the present invention is anexposure device for splitting sections of an alignment material filmcorresponding to picture elements of a liquid crystal display deviceinto two parts in the width direction thereof and exposing the film fromdifferent directions, whereby the alignment material film isphotoaligned; the exposure device having: a first and a second lightsource for outputting exposure light; a first mask in which is formed afirst light transmission region group in which a plurality of lighttransmission regions for transmitting the exposure light from the firstlight source is arrayed in a single row; a first mask support portionfor supporting the first mask, the mask support portion being disposedtowards the second light source; a second mask in which is formed asecond light transmission region group in which a plurality of lighttransmission regions for transmitting the exposure light from the secondlight source is arrayed in a single row; and a second mask supportportion for supporting the second mask, the mask support portion beingdisposed towards the first light source; the respective plurality of thelight transmission regions of the first and second light transmissionregion groups corresponding to regions equivalent to one-half of onepicture element split in the width direction; and the exposure lightfrom the first light source and the second light source being caused tomutually intersect on the optical path between the first and secondlight sources and the alignment material film so that regions of thealignment material film which correspond to split regions of pictureelements are irradiated. This exposure device splits in two the pictureelements of the liquid crystal display device in the width direction,and exposes display device in the width direction, and exposes the insuch a way that the alignment directions thereof are differentdirections, and is suited to forming an aligned film having a wideviewing angle.

Yet another exposure device according to the present invention is anexposure device for causing sections of an alignment material filmcorresponding to pixels of a liquid crystal display device to be exposedfrom a different direction for each adjacent pixel in the widthdirection thereof, whereby the alignment material film is photoaligned;the exposure device having: a first and a second light source foroutputting exposure light; a mask in which there are formed a firstlight transmission region group and a second light transmission regiongroup in which a plurality of light transmission regions fortransmitting the exposure light from the first and second light sourcesis arrayed in single rows; and a mask support portion for supporting themask, the mask support portion being disposed towards the first lightsource; the first and second light transmission region groups beingdisposed spaced apart in the direction of relative scanning of thealignment material film with respect to the mask; the respectiveplurality of light transmission regions corresponding to regions thatinclude a plurality of pixels lined up in the scanning direction; thelight transmission regions of the first light transmission region groupand the light transmission regions of the second light transmissionregion group being arrayed with intervals therebetween such that thereis no overlap in the scanning direction; and the exposure light from thefirst light source and the second light source being caused to mutuallyintersect on the optical path between the first and second light sourcesand the alignment material film so that regions in the alignmentmaterial film that correspond to the regions including a plurality ofpixels lined up in the scanning direction are irradiated. This exposuredevice exposes the pixels of a liquid crystal display device in such away that the alignment direction is a different direction for eachadjacent pixel in the width direction thereof, and is suitable, forexample, to form a polarizing film for use as a polarizing film in a 3Ddisplay.

Yet another exposure device according to the present invention is anexposure device for causing sections of an alignment material filmcorresponding to pixels of a liquid crystal display device to be exposedfrom a different direction for each adjacent pixel in the widthdirection thereof, whereby the alignment material film is photoaligned;the exposure device having: a first and a second light source foroutputting exposure light; a first mask in which is formed a first lighttransmission region group in which a plurality of light transmissionregions for transmitting the exposure light from the first light sourceis arrayed in a single row; a first mask support portion for supportingthe first mask, the mask support portion being disposed towards thesecond light source; a second mask in which is formed a second lighttransmission region group in which a plurality of light transmissionregions for transmitting the exposure light from the second light sourceis arrayed in a single row; and a second mask support portion forsupporting the second mask, the mask support portion being disposedtowards the first light source; the respective plurality of the lighttransmission regions of the first and second light transmission regiongroups corresponding to regions that include a plurality of pixels linedup in the scanning direction; and the exposure light from the firstlight source and the second light source being caused to mutuallyintersect on the optical path between the first and second light sourcesand the alignment material film so that regions of the alignmentmaterial film that correspond to the regions including a plurality ofpixels lined up in the scanning direction are irradiated. This exposuredevice exposes the pixels of a liquid crystal display device in such away that the alignment direction is a different direction for eachadjacent pixel in the width direction thereof; and is suitable, forexample, to form a polarizing film for use as a polarizing film in a 3Ddisplay.

In the exposure device according to the present invention, the positionof intersection of exposure light from the first light source andexposure light from the second light source is between the first andsecond light sources and the mask, for example. Alternatively, theposition of intersection of exposure light from the first light sourceand exposure light from the second light source is between the mask andthe alignment material film.

Effect of the Invention

In the exposure device according to the present invention, exposurelight from the first light source and exposure light from the secondlight source are caused to intersect on the optical path between thefirst and second light sources and the alignment material film, andirradiate regions that correspond to split regions of the pictureelements, or to regions including a plurality of pixels lined up in thescanning direction, in the alignment material film. In so doing, thedistance between the light sources can be shorter, as compared to thecase in which the exposure light does not intersect. Therefore, ascompared with conventional exposure devices, the exposure device of thepresent invention has a wider range in which irradiation can take placefree from interference of the device with the exposure light, and thealignment material film can be exposed in the normal manner, even whenthe angle of the exposure light with respect to the surface beingexposed is small.

Moreover, because the distance between the light sources can be shorter,the device can be more compact overall.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 (a) is a side view showing multidomain alignment by an exposuredevice according to a first embodiment of the invention, and (b) is aperspective view thereof;

FIG. 2 (a) is a plan view showing a mask in the exposure deviceaccording to the first embodiment of the invention, (b) is an enlargedview of section A showing a portion of a light transmission region groupin FIGS. 2 (a), and (c) is a diagram showing an alignment film formed bya single exposure in the exposure device according to the firstembodiment of the invention;

FIG. 3 is a schematic diagram showing the relationship of the mask andthe exposure light in the exposure device according to the firstembodiment of the invention;

FIGS. 4 (a) and (b) are diagrams showing a modification of the mask inthe exposure device according to the first embodiment of the invention,and (c) is a diagram showing an alignment film formed by the mask ofFIGS. 4 (a) and (b);

FIG. 5 (a) is a side view showing multidomain alignment exposure by anexposure device according to a second embodiment of the invention, and(b) is a perspective view thereof;

FIG. 6 is a schematic diagram showing the relationship of the mask andthe exposure light in the exposure device according to the secondembodiment of the invention;

FIG. 7 (a) is a side view showing multidomain alignment exposure by anexposure device according to a third embodiment of the invention, and(b) is a perspective view thereof;

FIG. 8 is a plan view showing the mask in the exposure device accordingto a third embodiment of the invention;

FIG. 9 (a) is a side view showing multidomain alignment exposure by aconventional exposure device, and (b) is a perspective view thereof;

FIG. 10 (a) is a plan view showing a mask in a conventional exposuredevice, (b) is an enlarged view of section A showing a portion of alight transmission region group in FIGS. 10 (a), and (c) is a diagramshowing an alignment film formed by a single exposure in theconventional exposure device; and

FIG. 11 is a schematic diagram showing the relationship of the mask andthe exposure light in the conventional exposure device.

EMBODIMENTS FOR CARRYING OUT THE INVENTION

The embodiments of the present invention are described in specific termsbelow, making reference to the accompanying drawings. Firstly, theconstitution of an exposure device of a first embodiment is described.FIG. 1 (a) is a side view showing multidomain alignment by an exposuredevice according to a first embodiment of the invention, and (b) is aperspective view thereof. FIG. 2 (a) is a plan view showing a mask inthe exposure device according to the first embodiment of the invention,FIG. 2 (b) is an enlarged view of section A showing a portion of a lighttransmission region group in FIG. 2 (a), and FIG. 2(c) is a diagramshowing an alignment film formed by a single exposure in the exposuredevice according to the first embodiment of the invention. FIG. 3 is aschematic diagram showing the relationship of the mask and the exposurelight in the exposure device according to the first embodiment of theinvention. In the present embodiment, a case in which the lighttransmission regions are constituted so as to extend in the scanningdirection, with each light transmission region corresponding to a regionthat includes a plurality of pixels lined up in the scanning direction,and regions of uniform alignment direction are formed to extend in aband in the scanning direction, through continuous exposure.

As shown in FIG. 1, the exposure device 1 is constituted by two lightsources (a first light source 11 and a second light source 12) foroutputting exposure light 11 a, 12 a; a mask 13 having a pattern formedon the surface; and a mask stage 14 for supporting the mask 13. A memberfor exposure 2 (for example, a glass substrate with an alignmentmaterial film formed on the surface) supported on a stage 15 isirradiated with the exposure light 11 a, 12 a, and aligned inpredetermined directions. In FIGS. 1, 2, and other drawings, the memberfor exposure 2 is shown as being slightly larger than the mask; however,the present invention imposes no limitation as to the size of the memberfor exposure 2.

The first and second light sources 11, 12 are light sources forrespectively outputting ultraviolet light, for example. Mercury lamps,xenon lamps, excimer lamps, ultraviolet LEDs, and the like, for example,are suitable for use. A collimator lens and/or a reflecting mirror orthe like, for example, are disposed respectively on the optical paths ofthe exposure light output by the first and second light sources 11, 12,so that, for example, the alignment material film on the surface of themember for exposure 2 is irradiated with a predetermined quantity oflight by the first and second light sources 11, 12. The output directionof the exposure light 11 a, 12 a can be adjusted, for example, throughcontrol of the first and second light sources 11, 12 by a control device(not illustrated). A constitution whereby the angle of incidence on themember for exposure 2 is adjustable is thereby achieved. In the exposuredevice 1 of the present embodiment, the beams of exposure light 11 a, 12a from the first and second light sources 11, 12 are output so as tomutually intersect between the first and second light sources 11, 12 andthe mask 13. In the present embodiment, both of the beams of theexposure light 11 a, 12 a are linear-polarized exposure light that iseither P-polarized or S-polarized, for example, and do not interferewith one another even in the case of intersection on the optical pathsthereof. By irradiating the alignment material film with the exposurelight 11 a and the exposure light 12 a at respectively differentpre-tilt angles, the alignment directions of the liquid crystalmolecules can be made to differ from one another, and, for example, thealignment direction of the alignment film can be increased to twodirections for each single picture elements or each of adjacent pixelsin the width direction, to increase the viewing angle of a liquidcrystal display or the like.

As shown in FIG. 1 (b), the mask 13 is constituted, for example, by aframe 130 and a pattern formation portion 131 at the center thereof. Asshown in FIG. 2 (a), in the pattern formation portion 131, there areformed a first light transmission region group 131 a and a second lighttransmission region group 131 b in which a plurality of lighttransmission regions are respectively arrayed in a single row in adirection perpendicular to the scanning direction and correspondingrespectively to the exposure light from the first or second light source11, 12. In the present embodiment, the first light transmission regiongroup 131 a and the second light transmission region group 131 b aredisposed spaced apart in the direction of relative scanning of thealignment material film with respect to the mask 13. As shown in FIG. 2(b), the respective plurality of light transmission regions correspondto regions that extend in the scanning direction and include a pluralityof pixels lined up in the scanning direction. The light transmissionregions of the first light transmission region group 131 a and the lighttransmission regions of the second light transmission region group 131 bare arrayed with intervals therebetween such that there is no overlap inthe scanning direction. For example, the light transmission regions ofthe first light transmission region group 131 a and the lighttransmission regions of the second light transmission region group 131 bare arrayed in staggered fashion to one another along a directionperpendicular to the scanning direction, such that there is no overlapin the scanning direction. In the present embodiment, the lighttransmission regions of the first and second light sources 11, 12 areapertures of a shape for transmitting the exposure light 11 a, 12 a, orlight-transmissive members. By irradiating the respectively differentregions 131 a, 131 b of the mask 13 with the exposure light 11 a, 12 afrom the first and second light sources 11, 12 from differentdirections, the light transmitted through the light transmission regionsirradiates and exposes the alignment material film on the surface of themember for exposure 2, which is supported on the stage 15. As shown inFIG. 2 (a), in the present embodiment, of the light transmission regionsof the pattern formation portion 131, the first light transmissionregion group 131 a corresponding to the exposure light 11 a output fromthe first light source 11 is formed to the second light source 12 side,and the second light transmission region group 131 b corresponding tothe exposure light 12 a output from the second light source 12 is formedto the first light source 11 side. Therefore, as shown in FIG. 2 (c), inthe present embodiment, the areas exposed by the exposure light 11 afrom the first light source 11 and the areas exposed by the exposurelight 12 a from the second light source 12 are situated mutually spacedapart.

The mask stage 14 supports the frame 130 of the mask 13, to the firstlight source 11 side. In the present invention, the light source on themask stage 14 side is termed the first light source 11; however, thedesignations “first” and “second” have no particular significance. Themask stage 14 is either affixed to another component, not illustrated,inside the exposure device, or is constituted such that the mask stage14 can move in coincidence with the area being exposed by the exposurelight. For example, the mask stage 14 is moveable in the horizontaldirection, in coincidence with the angle of slope of the exposure light11 a and/or the exposure light 12 a with respect to the exposure surfaceof the member for exposure 2. For example, the mask stage 14 isconstituted to be moveable in the vertical direction as well.

The stage 15 supporting the member for exposure 2 is adjustable inposition through computer control, for example. By moving the stage 15after the member for exposure 2 has been placed thereon, the areairradiated by the exposure light on the surface of the member forexposure 2 can be moved. In so doing, a plurality of areas on the memberfor exposure 2 can be exposed in succession.

As shown in FIG. 2, in the present embodiment, the areas on the surfaceof the member for exposure 2 which are irradiated by the two beams ofexposure light 11 a, 12 a transmitted through the mask 13 are areas,corresponding to the apertures or light-transmissive members of themask, in which a plurality of picture elements (constituted by three R,G, and B picture elements) of a liquid crystal display or the like lineup in one direction (the scanning direction of the exposure device),with the areas exposed by the exposure light 11 a from the first lightsource 11 and the areas exposed by the exposure light 12 a from thesecond light source 12 being at positions mutually spaced apart.Consequently, while simultaneous exposure of areas of mutually adjacentpixels is not possible, unexposed adjacent pixels are exposed by theother beam of exposure light, by carrying out exposure while moving thestage 15. Specifically, in the present embodiment, exposure of mutuallyadjacent pixels is carried out at staggered timing, forming an alignmentfilm of mutually adjacent areas exposed by the exposure light 11 aoutput from the first light source 11 and areas exposed by the exposurelight 12 a output from the second light source 12.

As shown in FIG. 9, in a conventional exposure device, two beams ofexposure light at different output angles irradiate mutually adjacentregions equivalent to one-half of one picture element, or pixelsadjacent in the width direction, so that a single picture element, orpixels adjacent in the width direction, are respectively exposedsimultaneously by two different light sources. In contrast to this, inthe exposure device 1 of the present embodiment, the exposure light 11a, 12 a from the first and second light sources 11, 12 is output in sucha way that the beams intersect on the optical path between the first andsecond light sources 11, 12 and the mask 13, and are respectivelytransmitted through the pattern lying towards the other light source,with the two beams of exposure light irradiating the surface of themember for exposure 2 at mutually spaced apart locations. Therefore, inthe present embodiment, the distance between the first light source 11and the second light source 12 can be shorter, and the device can besmaller overall.

The operation of the exposure device of the present embodiment isdescribed next. Before initiating exposure, firstly, the member forexposure 2, for example, a glass substrate on which an alignmentmaterial film of predetermined thickness has been formed on the topsurface, is placed on the stage 15. At this time, the position of themember for exposure 2 is adjusted, for example, so that the surface forexposure of the alignment material film on the member for exposure 2 isparallel to the top surface of the stage 15. Moreover, the position ofthe member for exposure 2 is adjusted, for example, so that the zone forexposure of the alignment material film lies within the exposure regionof the exposure light. In preferred practice, this adjustment of theposition of the member for exposure 2 is performed after placing themember for exposure 2 on the stage 15, through movement of the stage,which is moveable by computer control for example. In so doing, aplurality of regions can be exposed in succession on the member forexposure 2.

Next, the directions in which to align the alignment material film aredetermined for each region that will become a pixel lined up in thescanning direction. The directions of output of exposure light from thefirst and second light sources 11, 12 are then determined incorresponding fashion with the alignment directions so determined, insuch a way that the split regions will be irradiated with exposure lightat predetermined angles. Next, the distance between the first lightsource 11 and the second light source 12 is adjusted in such a way thatpredetermined regions of the alignment material film formed on themember for exposure 2 can be irradiated with the exposure light, and theposition of the patterns of light transmission regions of the mask 13are adjusted through adjustment of the position of the mask stage 14.The mask 13 is selected to coincide with the pattern to be exposed onthe alignment material film.

In the present embodiment, the positions of the first light source 11and the second light source 12 are adjusted such that the exposure light11 a output from the first light source 11 and the exposure light 12 aoutput from the second exposure light 12 mutually intersect on theoptical path prior to irradiating the pattern formation portion 131 ofthe mask 12. Consequently, the distance between the first light source11 and the second light source 12 can be shorter, as compared with aconventional exposure device. Therefore, irradiation by the exposurelight 11 a, 12 a can take place over a wider range free frominterference by the device itself (for example, by the mask stage 14 orthe frame 130 of the mask).

Once the positions of the first and second light sources 11, 12 and themask 13 have been determined, next, exposure light is output from thelight sources. The exposure light 11 a, 12 a output from the lightsources is transmitted or reflected by optical members, such as acollimator lens and/or mirror, or the like for example, directing apredetermined quantity of light onto the mask 13.

In the present embodiment, the exposure light 11 a output from the firstlight source 11 and the exposure light 12 a output from the second lightsource 12 mutually intersect on the optical path leading to the patternformation portion 131. However, the exposure light 11 a, 12 a isdirected onto the alignment material film in a manner free of mutualinterference between them. Because the two beams of exposure light 11 a,12 a are made to mutually intersect, even when the angle of slope of theexposure light 11 a, 12 a with respect to surface for exposure is small,the exposure light 11 a, 12 a is directed onto the predetermined lightexposure regions 131 a, 131 b of the mask 13 in a manner free ofinterference with the mask stage or the like. When the exposure light 11a, 12 a irradiates the respective corresponding light exposure regions131 a, 131 b of the pattern formation portion 131, the exposure light 11a, 12 a is transmitted through the mask 13 in a manner corresponding tothe pattern of light transmission regions of the pattern formationportion 131, and the light transmitted through the mask is directed ontothe member for exposure 2.

The exposure light 11 a and the exposure light 12 a irradiate regionsmutually spaced apart on the alignment material film. In the presentembodiment, the regions irradiated through the light transmissionregions of the mask 13 by the exposure light 11 a and the exposure light12 a are, for example, a plurality of regions corresponding to pixels(constituted by three R, G, B picture elements) of a liquid crystaldisplay or the like, which line up in one direction (the scanningdirection in the exposure device), with the regions that will constitutethe plurality of pixels lined up in the scanning direction beingrespectively exposed through the respective plurality of lighttransmission regions that have been formed in the pattern formationportion 131 of the mask 13 (and that line up in the width directionperpendicular to the scanning direction). In the regions irradiated bythe exposure light 11 a and the exposure light 12 a, the alignmentmaterial film, due to its photodegradation characteristic, aligns inpredetermined directions corresponding to the angle of irradiation bythe exposure light. Therefore, the alignment material film, in theregions thereof irradiated by the exposure light 11 a, aligns in a firstdirection dependent on the angle of incidence of the exposure light 11a, while the alignment material film, in the regions thereof irradiatedby the exposure light 12 a, aligns in another second direction differentfrom the first direction and dependent on the angle of incidence of theexposure light 12 a. In so doing, for the plurality of pixels lined upin the scanning direction, alignment film aligned in the firstdirection, and alignment film aligned in the second direction, is formedso as to extend in a band in the scanning direction. In the presentembodiment, the exposure light 11 a, 12 a irradiating the alignmentmaterial film can expose the alignment material film in the normalmanner free from interference by the device itself on the optical path.

In a state of continued irradiation by the exposure light 11 a, 12 a inthis manner, by moving the stage 15 through computer control, and movingthe member for exposure 2 at a constant speed along the scanningdirection for example, the member for exposure 2 is continuously exposedthrough continuous irradiation by the exposure light 11 a, 12 a. In sodoing, adjacent pixels unexposed by one exposure light are ultimatelyexposed by the other exposure light, forming an alignment film ofmutually adjacent exposed regions produced by the exposure light 11 a ofthe first light source 11 and exposed regions produced by the exposurelight 12 a of the second light source 12.

Once all of the regions for exposure on the member for exposure 2 havebeen exposed, the member for exposure 2 is ejected from the exposuredevice 1, for example, by moving the stage 15. In this way, there may bemanufactured, on a glass substrate for example, an alignment film inwhich regions of band shape of uniform alignment direction are formed tocorrespond to pixels lined up in the scanning direction, with thealignment directions differing between adjacent pixels in a directionperpendicular to the scanning direction. Liquid crystals are thensandwiched between the alignment films of two glass substratesmanufactured in this manner. Thereupon, the calamitic molecules of theliquid crystals orient in a predetermined direction due to the alignmentdirection of the alignment films. In so doing, a multidomain alignmentsystem liquid crystal display material affording a wide viewing angle isperfected. Polarized films, such as those for a 3D display, can also bemanufactured by the method for forming an alignment film as in thepresent embodiment. Specifically, by irradiating individual regions toconstitute adjacent pixels in the width direction of the film forexample, by exposure light from two light sources, doing so withexposure light of linear-polarized light, namely, P-polarized light andS-polarized light in alternating fashion, the alignment direction of thealignment material film can be varied in each of the pixels constitutedby a plurality of picture elements. In so doing, there can be obtainedan alignment film having a function comparable to a ¼λ panel in whichthe alignment directions at the film surface mutually differ by 90°, andthe resulting film can be used as a polarized film. Specifically, bycausing light for image display, which is linear-polarized light, to betransmitted through the polarized film, each of display rows constitutedby a plurality of pixels and extending in the width direction of thefilm can be made to output transmitted light which is circular-polarizedlight of mutually opposite rotation directions. These two beams oftransmitted light of circular-polarized light can be used respectivelyas display light for the right eye and the left eye in a 3D display, forexample.

In the above manner, in the exposure device 1 of the present embodiment,the exposure light 11 a, 12 a is output in such a way as to mutuallyintersect on the optical path between the first and second light sources11, 12 and the mask 13, and therefore the distance between the firstlight source 11 and the second light source 12 can be smaller, and thealignment material film can be exposed in the normal manner, even whenthe angle of the exposure light 11 a, 12 a with respect to the surfacefor exposure is small.

As shown in FIG. 2 (b), in the present embodiment, the lighttransmission regions of the first and second light transmission regiongroups 131 a, 131 b of the mask 13 respectively correspond to regionsthat include a plurality of pixels lined up in the scanning direction;however, this represents a case in which an alignment film of uniformalignment direction extending in the scanning direction is formed bycontinuous exposure to exposure light. The present invention is notlimited to this mode, and can be applied in a case in which a member forexposure is exposed through intermittent irradiation by exposure lightas well. Specifically, as shown in FIG. 4 (a) and FIG. 4 (b) forexample, the light transmission regions of the first and second lighttransmission region groups 131 a, 131 b can be split into a plurality ofregions in the scanning direction (in FIG. 4 (b), six), with each ofthese light transmission regions corresponding to a region equivalent toa single picture element split in two in the width directionperpendicular to the scanning direction. In so doing, regionscorresponding to a plurality of picture elements can be exposed througha single exposure cycle. The member for exposure 2 is then moved, forexample by the stage 15, at a constant speed on the horizontal along thescanning direction, for example, towards the first light source 11 sideor the second light source side 12, while performing exposure throughirradiation with exposure light, each time that it has moved by adistance of movement equal to the length of the pattern in the scanningdirection (in the present modification, a length equivalent to sixpicture elements (see FIG. 4)). In this case, however, it is preferablethat the regions irradiated on the surface of the member for exposure 2by the two beams of exposure light be spaced apart, for example, by anintegral multiple of the picture element length. Specifically, as shownin FIG. 4 (c), in the present modification as well, the regions exposedby the first light source 11 and the regions exposed by the second lightsource 12 are mutually spaced apart; and by adopting an integralmultiple of the picture element length as the distance therebetween, inpicture elements in which a region equivalent to one-half thereof hasalready been exposed by one of the light sources, the region equivalentto the other half can be exposed by the other light source, inaccurately matching fashion. In so doing, there is manufactured a filmin which a plurality of regions equivalent to single picture elementssplit into two, and in which the alignment film in each split region ofthe regions is respectively formed with a different alignment direction,are lined up in a matrix arrangement.

In the present embodiment, the configuration is such that the stage 15is moveable along the scanning direction by computer control; however,in the exposure device of the present invention, there is no limitationto the mode of the present embodiment, and the direction in which thestage 15 is moved can be controlled by computer as well, for example.Specifically, in case in which stepped exposure is performed, as in theaforedescribed modification for example, the direction in which thestage 15 is moved can be controlled in such a way that, after completingformation of the alignment film in a first zone for exposure, theregions in which the pattern has been formed are moved in the widthdirection, which is the direction in which the picture elements aresplit, for example. In so doing, zones for exposure situated adjacentlyin the width direction of the picture elements are exposed insuccession. Moreover, even in cases in which, for example, thedisposition of the zones for exposure in the member for exposure 2 isnot such that they are mutually adjacent (continuous), by moving thestage 15 and disposing the zones for exposure in regions irradiated bythe exposure light, the zones for exposure can undergo stepped exposurein succession.

Next, an exposure device according to a second embodiment of the presentinvention is described. FIG. 5 (a) is a side view showing multidomainalignment exposure by an exposure device according to a secondembodiment of the invention, and (b) is a perspective view thereof. FIG.6 is a schematic diagram showing the relationship of the mask and theexposure light in the exposure device according to the second embodimentof the invention.

The first embodiment was constituted such that the exposure light 11 a,12 a outputted by the first and second light sources 11, 12 intersectbetween the first and second light sources 11, 12 and the mask 13. Inthe present embodiment, however, intersection position of the two beamsof exposure light 11 a, 12 a output by the first and second lightsources 11, 12 is between the mask 13 and the alignment material film,as shown in FIGS. 5 and 6.

Moreover, the positions of the mask 13 and the mask stage 14 are furtheraway from the member for exposure 2, as compared with the firstembodiment. The constitution is otherwise comparable to the firstembodiment.

In the present embodiment, because the exposure light 11 a, 12 amutually intersects between the mask 13 and the alignment material film,as shown in FIG. 5, the distance between the first light source 11 andthe second light source 12 must be slightly greater than in the case ofthe first embodiment, but the device overall can still be smaller insize than in the past.

Moreover, the range in which irradiation by the exposure light 11 a, 12a can take place free from interference by the device itself (forexample, by the mask stage 14 or the frame 130 of the mask) is widerthan in a conventional exposure device, and even when the angle of slopeof the exposure light 11 a, 12 a with respect to the surface forexposure is small, the alignment material film can be irradiated by theexposure light 11 a, 12 a free from interference by the mask stage orthe like, and the alignment material film can be exposed in the normalmanner.

In the present embodiment, as in the first embodiment, the lighttransmission regions of the first and second light transmission regiongroups 131 a, 131 b are constituted so as to extend in the scanningdirection as shown in FIG. 2 (a) and FIG. 2 (b) for example; and bycausing the exposure light to be continuously transmitted through thelight transmission regions while moving the member for exposure 2 atconstant speed along the scanning direction, for example, the member forexposure 2 may be continuously irradiated and exposed by the exposurelight, to obtain an oriented film of uniform alignment direction inregions of band shape along the scanning direction, whereby a polarizedfilm for use in a 3D display, for example, can be manufactured. In thiscase as well, because there is no need for the exposure regions havingbeen split into two and constituting picture elements to be adjacent,there is no limitation as to the distance in the scanning directionbetween the regions irradiated by the two beams of exposure light.

Regions irradiated by the exposure light 11 a from the first lightsource 11 and regions irradiated by the exposure light 12 a from thesecond light source 12 are positioned mutually spaced apart on thesurface of the member for exposure 2 as shown in FIG. 6. In a case inwhich exposure regions that correspond to a plurality of pictureelements are exposed each time that regions are irradiated with theexposure light while intermittently outputting exposure light, thedistance between these irradiated regions may be set to an integralmultiple of the length of a single picture element, for example, as inthe first embodiment. In so doing, as in the case of the modification ofthe first embodiment, after exposure has been completed in the stateshown in FIG. 6, by then, for example by moving the stage 15 to move themember for exposure 2 at a constant speed while irradiating the memberfor exposure with exposure light each time that it has moved by theequivalent of the length of the pattern in the scanning direction (inthe case of use of the mask 13 like that shown in FIG. 4, a lengthequivalent to six picture elements), there can be obtained an alignmentfilm in which the areas exposed by the exposure light 11 a and the areasexposed by the exposure light 12 a are adjacent, with regions equivalentto one-half a single pixel element being aligned in respectivelydifferent directions. Specifically, in the present embodiment as well,regions equivalent to a single picture element split into two areexposed at staggered timing. In so doing, there is manufactured a filmin which a plurality of regions equivalent to single picture elementssplit into two, and in which the alignment film in each split region ofthe regions is respectively formed with a different alignment direction,are lined up in a matrix arrangement.

An exposure device according to a third embodiment of the presentinvention is described next. FIG. 7 (a) is a side view showingmultidomain alignment exposure by an exposure device according to athird embodiment of the invention, and (b) is a perspective viewthereof. FIG. 8 is a plan view showing the mask in the exposure deviceaccording to a third embodiment of the invention.

As shown in FIG. 7, in the present embodiment, the mask 13 in the firstembodiment has been split into a first mask 13 a for transmission of theexposure light 11 a from the first light source 11, and a second mask 13b for transmission of the exposure light 12 a from the second lightsource 12. Consequently, as shown in FIG. 7 (b) and FIG. 8, the firstlight transmission region group 131 a for transmission of the exposurelight 11 a from the first light source 11 is furnished to the first mask13 a, while the second light transmission region group 131 b fortransmission of the exposure light 12 a from the second light source 12is furnished to the second mask 13 b. As in the first and secondembodiments, the first and second light transmission region groups 131a, 131 b are respectively disposed in a single row so as to line up in adirection perpendicular to the scanning direction. The respectiveplurality of light transmission regions extend in the scanningdirection, and correspond to regions that include a plurality of pixelslined up in the scanning direction. The first mask 13 a and the secondmask 13 b are respectively supported on mask stages 14, and are therebyconstituted such that the first mask 13 a and the second mask 13 b arerespectively moveable independently. Specifically, in the presentembodiment, as shown in FIG. 7, the mask stage 14 that supports thefirst mask 13 a is disposed on the second light source 12 side, whilethe mask stage 14 that supports the second mask 13 b is disposed on thefirst light source 11 side. The constitution is otherwise comparable tothe first embodiment.

In the present embodiment, as in the exposure device of the firstembodiment, the distance between the first light source 11 and thesecond light source 12 can be smaller, the device can be made morecompact in size overall, and the range in which irradiation by theexposure light 11 a, 12 a can take place free from interference by thedevice itself (for example, by the mask stages 14 or the frame 130 ofthe mask) is wider; moreover, even when the angle of slope of theexposure light 11 a, 12 a with respect to the surface for exposure issmall, the alignment material film can be exposed in the normal manner.Furthermore, in the present embodiment, the mask 13 has been split intothe first mask 13 a and the second mask 13 b which are respectivelysupported by the mask stages 14 so as to be moveable independently,whereby the position of the mask, the quantity of the exposure lightirradiating the member for exposure 2, and other variables can beadjusted for each light source. Consequently, in a case in which, forexample, the exposure light from one of the light sources fails toirradiate a predetermined quantity of light onto the member for exposure2, the mask 13 a or the mask 13 b for transmitting the target exposurelight can be moved by the mask stage 14 to adjust the position orquantity of the exposure light.

In the present embodiment, as in the first and second embodiments, thelight transmission regions of the first and second light transmissionregion groups 131 a, 131 b are constituted so as to extend in thescanning direction as shown in FIG. 2 (a) and FIG. 2 (b) for example;and by causing the exposure light to be continuously transmitted throughthe light transmission regions while moving the member for exposure 2 atconstant speed along the scanning direction, for example, the member forexposure 2 may be continuously irradiated and exposed by the exposurelight, to obtain an oriented film of uniform alignment direction inregions of band shape along the scanning direction, whereby a polarizedfilm for use in a 3D display, for example, can be manufactured.

In the present embodiment as well, as shown, for example, in FIG. 4 (a)and FIG. 4 (b), stepped exposure may be performed while splitting thelight transmission regions of the first and second light transmissionregions light transmission region groups 131 a, 131 b into a pluralityof regions along the scanning direction, with each light transmissionregion corresponding to a region equivalent to one picture element splitinto two in the width direction perpendicular to the scanning direction;and a film in which a plurality of regions equivalent to single pictureelements split into two, and in which the alignment film in each splitregion of the regions is respectively formed with a different alignmentdirection, are lined up in a matrix arrangement, can be manufactured.

INDUSTRIAL APPLICABILITY

The exposure device of the present invention photoaligns an alignmentmaterial film by splitting portions of the alignment material film whichcorrespond to picture elements of a liquid crystal display device intotwo parts, and exposing these from different directions; or by exposingportions which correspond to pixels from a different direction in eachadjacent pixel in the width direction thereof. In this way, with theexposure device of the present invention, during manufacture of analignment material film for a liquid crystal display device displayingthree-dimensional images, the alignment material film can undergomultidomain exposure in a predetermined pattern in the normal manner.

KEY

-   -   1 Exposure device    -   11 First light source    -   12 Second light source    -   11 a Exposure light (from first light source)    -   12 a Exposure light (from second light source)    -   13 Mask    -   13 a First mask    -   13 b Second mask    -   130 Frame    -   131 Pattern formation portion    -   131 a First light transmission region group    -   131 b Second light transmission region group    -   14 Mask stage    -   15 Stage    -   2 Member for exposure

The invention claimed is:
 1. A method of manufacturing of an alignmentmaterial film, said method comprising: photoaligning the alignmentmaterial film by an exposure device to split each of sections of thealignment material film corresponding to picture elements of a liquidcrystal display device into two parts in a width direction of thepicture elements and exposing the alignment material film from differentdirections of each other, wherein, in the exposure device, said each ofsections of the alignment material film corresponding to the pictureelements of the liquid crystal display device is split into two parts inthe width direction of the picture elements and the two parts areexposed from the different directions of each other, whereby thealignment material film is photoaligned, the exposure device comprising:a first light source and a second light source for outputting exposurelight; a mask in which there are formed a first light transmissionregion group in which a plurality of light transmission regions fortransmitting the exposure light from said first light source are arrayedin a single row and a second light transmission region group in which aplurality of light transmission regions for transmitting the exposurelight from said second light source are arrayed in a single row; a masksupport portion for supporting said mask, the mask support portion beingdisposed towards said first light source; and a movement device forcausing the alignment material film and said mask to move relative toeach other so that the alignment material film is scanned using saidexposure light, said first and second light transmission region groupsbeing disposed spaced apart in a direction of relative scanning of saidalignment material film with respect to said mask, the plurality oflight transmission regions respectively corresponding to regionsequivalent to one-half of one picture element split in the widthdirection, the light transmission regions of said first lighttransmission region group and the light transmission regions of saidsecond light transmission region group being arrayed, in a directionperpendicular to said scanning direction, with intervals therebetweensuch that there is no overlap in said scanning direction, and theexposure light from said first light source and said second light sourcebeing caused to be inclined so as to mutually intersect above said maskon an optical path between said first and second light sources and saidmask and being transmitted through said first light transmission regiongroup and said second light transmission region group of said mask sothat regions of said alignment material film which correspond to splitregions of picture elements are irradiated.
 2. The method according toclaim 1, wherein the exposure light from said first light source istransmitted to an adjacent side of the mask to said second light source,which is located farther than an adjacent side of the mask to said firstlight source.
 3. The method according to claim 2, wherein the exposurelight from said second light source is transmitted to the adjacent sideof the mask to said first light source.
 4. The method according to claim1, wherein, in the scanning direction, the light transmission regions ofsaid first light transmission region group are located in a side of saidsecond light source on the mask.
 5. The method according to claim 4,wherein, in the scanning direction, the light transmission regions ofsaid second light transmission region group are located in a side ofsaid first light source on the mask.
 6. The method according to claim 1,wherein, with respect to a centerline of the mask in the directionperpendicular to said scanning direction, an entirety of the lighttransmission regions of said first light transmission region group islocated in a side of said second light source on the mask.
 7. The methodaccording to claim 1, wherein the exposure light from the first lightsource and the exposure light from the second exposure light mutuallyintersect on the optical path prior to irradiating the regions of saidalignment material film.
 8. The exposure device according to claim 1,wherein a position of an intersection of the exposure light from saidfirst light source and the exposure light from said second light sourceis between said first and second light sources and said mask.
 9. Amethod of manufacturing of an alignment material film, said methodcomprising: photoaligning the alignment material film by an exposuredevice to split each of sections of the alignment material filmcorresponding to picture elements of a liquid crystal display deviceinto two parts in a width direction of the picture elements and exposingthe alignment material film from different directions of each other,wherein, in the exposure device, said each of sections of the alignmentmaterial film corresponding to the picture elements of the liquidcrystal display device is split into two parts in the width direction ofthe picture elements and the two parts are exposed from differentdirections of each other, whereby the alignment material film isphotoaligned, the exposure device comprising: a first light source and asecond light source for outputting exposure light; a first mask in whichis formed a first light transmission region group in which a pluralityof light transmission regions for transmitting the exposure light fromsaid first light source are arrayed in a single row; a first masksupport portion for supporting said first mask, the first mask supportportion being disposed towards said second light source; a second maskin which is formed a second light transmission region group in which aplurality of light transmission regions for transmitting the exposurelight from said second light source are arrayed in a single row; asecond mask support portion for supporting said second mask; and amovement device for causing said alignment material film and said firstand second masks to move relative to each other so that the alignmentmaterial film is scanned using said exposure light, the respectiveplurality of the light transmission regions of said first and secondlight transmission region groups corresponding to regions equivalent toone-half of one picture element split in the width direction, the lighttransmission regions of said first light transmission region group andthe light transmission regions of said second light transmission regiongroup being arrayed, in a direction perpendicular to said scanningdirection, with intervals therebetween such that there is no overlap insaid scanning direction, and the exposure light from said first lightsource and said second light source being caused to be inclined so as tomutually intersect above said mask on an optical path between said firstand second light sources and said mask and being transmitted throughsaid first light transmission region group and said second lighttransmission region group of said mask so that regions of said alignmentmaterial film which correspond to split regions of picture elements areirradiated.
 10. The method according to claim 9, wherein, with respectto a centerline of the mask in the direction perpendicular to saidscanning direction, an entirety of the light transmission regions ofsaid first light transmission region group is located in a side of saidsecond light source on the mask.
 11. A method of manufacturing of analignment material film, said method comprising: photoaligning thealignment material film by an exposure device to cause sections of thealignment material film corresponding to pixels of a liquid crystaldisplay device to be exposed from a different direction for eachadjacent pixel in a width direction thereof, wherein, in the exposuredevice, the sections of the alignment material film corresponding to thepixels of the liquid crystal display device are exposed from thedifferent direction for said each adjacent pixel in the width directionthereof, whereby the alignment material film is photoaligned, theexposure device comprising: a first light source and a second lightsource for outputting exposure light; a mask in which there are formed afirst light transmission region group in which a plurality of lighttransmission regions for transmitting the exposure light from said firstlight source are arrayed in a single row and a second light transmissionregion group in which a plurality of light transmission regions fortransmitting the exposure light from said second light source arearrayed in a single row; a mask support portion for supporting saidmask, the mask support portion being disposed towards said first lightsource; and a movement device for causing said alignment material filmand said mask to move relative to each other so that the alignmentmaterial film is scanned using said exposure light, said first andsecond light transmission region groups being disposed spaced apart in adirection of relative scanning of said alignment material film withrespect to said mask, the respective plurality of light transmissionregions corresponding to regions that include a plurality of pixelslined up in a scanning direction, the light transmission regions of saidfirst light transmission region group and the light transmission regionsof said second light transmission region group being arrayed, in adirection perpendicular to said scanning direction, with intervalstherebetween such that there is no overlap in said scanning direction,and the exposure light from said first light source and said secondlight source being caused to be inclined so as to mutually intersectabove said mask on an optical path between said first and second lightsources and said mask and being transmitted through said first lighttransmission region group and said second light transmission regiongroup of said mask so that regions in said alignment material film thatcorrespond to the regions including a plurality of pixels lined up insaid scanning direction are irradiated.
 12. The method according toclaim 11, wherein the exposure light from said first light source istransmitted to an adjacent side of the mask to said second light source,which is located farther than an adjacent side of the mask to said firstlight source.
 13. The method according to claim 12, wherein the exposurelight from said second light source is transmitted to the adjacent sideof the mask to said first light source.
 14. A method of manufacturing ofan alignment material film, said method comprising: photoaligning thealignment material film by an exposure device to cause sections of thealignment material film corresponding to pixels of a liquid crystaldisplay device to be exposed from a different direction for eachadjacent pixel in a width direction thereof, wherein, in the exposuredevice, the sections of the alignment material film corresponding to thepixels of the liquid crystal display device are exposed from thedifferent direction for said each adjacent pixel in the width directionthereof, whereby the alignment material film is photoaligned, theexposure device comprising: a first light source and a second lightsource for outputting exposure light; a first mask in which is formed afirst light transmission region group in which a plurality of lighttransmission regions for transmitting the exposure light from said firstlight source are arrayed in a single row; a first mask support portionfor supporting said first mask, the first mask support portion beingdisposed towards said second light source; a second mask in which isformed a second light transmission region group in which a plurality oflight transmission regions for transmitting the exposure light from saidsecond light source are arrayed in a single row; a second mask supportportion for supporting said second mask, the second mask support portionbeing disposed towards said first light source; and a movement devicefor causing said alignment material film and said first and second masksto move relative to each other so that the alignment material film isscanned using said exposure light, the respective plurality of the lighttransmission regions of said first and second light transmission regiongroups corresponding to regions that include a plurality of pixels linedup in said scanning direction, the light transmission regions of saidfirst light transmission region group and the light transmission regionsof said second light transmission region group being arrayed, in adirection perpendicular to said scanning direction, with intervalstherebetween such that there is no overlap in said scanning direction,and the exposure light from said first light source and said secondlight source being caused to be inclined so as to mutually intersectabove said first and second masks on an optical path between said firstand second light sources and said first and second masks and beingtransmitted through said first light transmission region group and saidsecond light transmission region group so that regions of said alignmentmaterial film that correspond to the regions including a plurality ofpixels lined up in said scanning direction are irradiated.
 15. Themethod according to claim 14, wherein the exposure light from the firstlight source and the exposure light from the second exposure lightmutually intersect on the optical path prior to irradiating the regionsof said alignment material film.